Recent developments in nanoengineered microchannel plates (MCPs) demonstrate a significant transition from conventional lead-glass electron multipliers towards advanced nanostructured amplification technologies for low-light imaging and photon detection. Atomic layer deposition (ALD) has become one of the most important enabling technologies for modern MCP fabrication by allowing resistive and secondary electron emission layers to be deposited with atomic-scale precision inside high-aspect-ratio microchannels. This manufacturing approach improves electron multiplication efficiency, operational lifetime, gain stability, and manufacturing reproducibility while reducing background noise. As a result, ALD-engineered MCPs are increasingly recognised as critical components for next-generation image intensifiers, intensified CMOS sensors, scientific instrumentation, space applications, and advanced defence systems. [1–5]
Among the most significant scientific developments is the optimisation of nanocomposite resistive coatings and secondary electron emission materials, including W:Al₂O₃, ZnO:Al₂O₃, Ru:Al₂O₃, Al₂O₃, and MgO deposited using atomic layer deposition. Recent research demonstrates that these engineered coatings provide substantially higher electron gain, improved signal-to-noise ratio, lower dark current, and significantly extended operational lifetime compared with conventional lead-glass MCPs. At the same time, advances in glass capillary array (GCA) manufacturing and scalable ALD processes have enabled the production of large-area microchannel plates with improved uniformity and reliability for photon-counting detectors, ultraviolet imaging, high-speed scientific cameras, and hybrid electro-optical sensing platforms. These developments demonstrate a broader transition towards reliable, manufacturable, and high-performance electron multiplication technologies suitable for future photonic systems. [1–5]
At the Photonics International R&D Center, we monitor advances in nanoengineered microchannel plate technologies to identify promising directions for research and industry. Our work evaluates MCP materials, ALD coatings, electron multiplication, lifetime, and detector performance. These activities create a pathway for new research projects in low-light detection, ultraviolet and near-infrared photonics, and next-generation imaging systems.
Future research will focus on scaling ALD manufacturing, improving coating uniformity across large-area devices, extending operational lifetime, and integrating nanoengineered MCPs with advanced photocathodes, EB-CMOS sensors, and AI-assisted image enhancement. These advances are expected to support hybrid imaging systems that combine analogue electron amplification with digital processing, delivering higher sensitivity, reliability, and performance. By aligning with emerging European research priorities and technology roadmaps, the Photonics International R&D Center strengthens its role in the European photonics ecosystem and supports scalable, application-oriented low-light sensing solutions.
REFERENCES
[1] Kessels, E., et al. (2025). Atomic Layer Deposition. Nature Reviews Methods Primers. https://doi.org/10.1038/s43586-025-00435-6
[2] Nguyen, C. T., et al. (2025). Ru:Al₂O₃ Resistive Coatings Fabricated by Atomic Layer Deposition for Application in Microchannel Plates. ACS Applied Engineering Materials. https://doi.org/10.1021/acsaenm.5c00676
[3] Piechulla, P. M., et al. (2025). Atomic Layer Deposition on Particulate Materials from 1988 through 2023: A Quantitative Review of Technologies, Materials, and Applications. Chemistry of Materials. https://doi.org/10.1021/acs.chemmater.5c01919
[4] Craven, C., et al. (2019). Recent Developments in Next-Generation Microchannel Plates for Particle Identification. Proceedings of SPIE, Vol. 11118. https://doi.org/10.1117/12.2530642
[5] O’Mahony, A., et al. (2016). Atomic Layer Deposition of Alternative Glass Microchannel Plates. Journal of Vacuum Science & Technology A. https://doi.org/10.1116/1.4938248